Techneglas’s premier planar
diffusing sources, BoronPlus
and PhosPlus, are a mature
product routinely used in semiconductors production. Utilizing
BoronPlus and PhosPlus,
the silicon can reliability be converted to n doping or p
doping by our superior control of the deposition process.
The resulting electrical properties
are very uniform and results in higher yields that other dopant
diffusion processes can not match, particularly for larger
wafer sizes. Many users obtain less silicon damage by using
Techneglas's superior dopant system.
Micro machining (MEMS), a growing
industry, has found our sources to fit their requirements
and is using them to make sensors, printer heads, and many
other MEMS devices.
BoronPlus and PhosPlus
are safe to use and does not require the use of explosive,
toxic, or hazardous gases. No toxic off-gases are produced
during the deposition.
Our BoronPlus and PhosPlus
planar diffusion sources offer a superior dopant system for
safe, cost effective, and reliable doping of silicon wafers.
Combined with process quality yields, their safe processing,
and non hazardous nature, many foundries have converted to
using these solid sources.