MEMS Application

Applications/Products


Product Bulletins

Moisture-Enhanced Evolution Rate Process Using GS-126 BoronPlus® Sources

Etch Stop Application for BoronPlus Sources

Processing Parameters

Source Preparation: Aging

Carrier Design

Cleaning BoronPlus

Cleaning PhosPlus

Ambient Gases

Storage

Troubleshooting

Process Recommendations

Typical Isolation Process Recommendation Using BoronPlus Sources

Typical Etch Stop Process Recommendation Using BoronPlus Sources

Typical Pholysilicon Gate Process Recommendation Using PhosPlus Sources

Typical Emitter Process Recommendation Using PhosPlus Sources


MEMS Application

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bn
boron doping
boron etchstop
boron nitride dopant
boron nitride doping
boron nitride source
boron resistivity
Carborundum
chemical doping
diffusion of boron
diffusion of phosphorous
diffusion preforms
Diffusion processing
diffusion source
Dopant chemicals
dopant evolution
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dopant purity
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Dopant sources
dopant uniformity
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doping MEMS
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glass dopant
hexagonal Boron Nitride materials
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implant boron
implant phosphorous
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leading supplier of solid planar diffusion
mems dopant

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micro machine dopant

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N dopant
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N+ dopant
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nano machine dopant
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OEM implanter
P dopant
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PDS
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phosphorous concentration
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Phosphorous dopants
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photovoltaic
Planar dopants
P-type dopants
pv dopant